U.S. Patents Awarded to Inventors in Connecticut (Aug. 18)

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ALEXANDRIA, Va., Aug. 18 -- The following federal patents were awarded to inventors in Connecticut.

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Bayer Healthcare Assigned Patent

ALEXANDRIA, Va., Aug. 18 -- Bayer Healthcare, Tarrytown, N.Y., has been assigned a patent (8,242,147) developed by four co-inventors for an "aryl ureas with angiogenisis inhibiting activity." The co-inventors are Jacques Dumas, Bethany, Conn., William J. Scott, Guilford, Conn., James Elting, Madison, Conn., and Holia Hatoum-Makdad, Hamden, Conn.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "This invention relates to methods of using aryl ureas to treat diseases mediated by the VEGF induced signal transduction pathway characterized by abnormal angiogenesis or hyperpermeability processes."

The patent application was filed on Sept. 23, 2010 (12/888,887). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,242,147&OS=8,242,147&RS=8,242,147

Written by Satyaban Rath; edited by Hemanta Panigrahi.

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International Business Machines Assigned Patent for Method of Fabricating a Deep Trench (DT) Metal-insulator-metal (MIM) Capacitor

ALEXANDRIA, Va., Aug. 18 -- International Business Machines, Armonk, N.Y., has been assigned a patent (8,241,981) developed by eight co-inventors for a "method of fabricating a deep trench (DT) metal-insulator-metal (MIM) capacitor." The co-inventors are Rishikesh Krishnan, Poughkeepsie, N.Y., Joseph F. Shepard Jr., Poughkeepsie, N.Y., Michael P. Chudzik, Danbury, Conn., Christian Lavoie, Ossining, N.Y., Dong-Ick Lee, Fishkill, N.Y., Oh-Jung Kwon, Hopewell Junction, N.Y., Unoh Kwon, Fishkill, N.Y., and Youngjin Choi, Hopewell Junction, N.Y.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A method includes providing an SOI substrate including a layer of silicon disposed atop a layer of an oxide, the layer of an oxide being disposed atop the semiconductor substrate; forming a deep trench having a sidewall extending through the layer of silicon and the layer of an oxide and into the substrate; depositing a continuous spacer on the sidewall to cover the layer of silicon, the layer of an oxide and a part of the substrate; depositing a first conformal layer of a conductive material throughout the inside of the deep trench; creating a silicide within the deep trench in regions extending through the sidewall into an uncovered part of the substrate; removing the first conformal layer from the continuous spacer; removing the continuous spacer; depositing a layer of a high k dielectric material throughout the inside of the deep trench, and depositing a second conformal layer of a conductive material onto the layer of a high-k dielectric material."

The patent application was filed on Jan. 31, 2011 (13/017,108). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,241,981&OS=8,241,981&RS=8,241,981

Written by Satyaban Rath; edited by Hemanta Panigrahi.

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Bristol-Myers Squibb Assigned Patent

ALEXANDRIA, Va., Aug. 18 -- Bristol-Myers Squibb, Princeton, N.J., has been assigned a patent (8,242,124) developed by nine co-inventors for "diketopiperidine derivatives as HIV attachment inhibitors." The co-inventors are Alicia Regueiro-Ren, Middletown, Conn., Jacob Swidorski, Southington, Conn., Zheng Liu, Beacon Falls, Conn., Tao Wang, Farmington, Conn., Zhongxing Zhang, Madison, Conn., Lawrence G. Hamann, North Grafton, Mass., Nicholas A. Meanwell, East Hampton, Conn., David J. Carini, Wallingford, Conn., and Wenying Li, West Windsor, N.J.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "Compounds having drug and bio-affecting properties, their pharmaceutical compositions and methods of use are set forth. In particular, diketopiperidine derivatives that possess unique antiviral activity are provided. These compounds are useful for the treatment of HIV and AIDS."

The patent application was filed on June 24, 2009 (12/490,727). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,242,124&OS=8,242,124&RS=8,242,124

Written by Satyaban Rath; edited by Hemanta Panigrahi.

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Advanced Technology Materials Assigned Patent

ALEXANDRIA, Va., Aug. 18 -- Advanced Technology Materials, Danbury, Conn., has been assigned a patent (8,242,032) developed by Ziyun Wang, Bethel, Conn., Chongying Xu, New Milford, Conn., and Thomas H. Baum, New Fairfield, Conn., for "monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same."

The abstract of the patent published by the U.S. Patent and Trademark Office states: "This invention relates to silicon precursor compositions for forming silicon-containing films by low temperature (e.g., <550.degree. C.) chemical vapor deposition processes for fabrication of ULSI devices and device structures. Such silicon precursor compositions comprise at least a silane or disilane derivative that is substituted with at least one alkylhydrazine functional groups and is free of halogen substitutes."

The patent application was filed on Jan. 4, 2011 (12/984,346). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,242,032&OS=8,242,032&RS=8,242,032

Written by Satyaban Rath; edited by Hemanta Panigrahi.

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International Business Machines Assigned Patent for Negative thermal Expansion System (NTES) Device for TCE Compensation in Elastomer Composites and Conductive Elastomer Interconnects in Microelectronic Packaging

ALEXANDRIA, Va., Aug. 18 -- International Business Machines, Armonk, N.Y., has been assigned a patent (8,241,957) developed by nine co-inventors for a "negative thermal expansion system (NTES) device for TCE compensation in elastomer composites and conductive elastomer interconnects in microelectronic packaging." The co-inventors are Gareth Geoffrey Hougham, Ossining, N.Y., S. Jay Chey, Ossining, N.Y., James Patrick Doyle, Bronx, N.Y., Xiao Hu Liu, Croton on Hudson, N.Y., Christopher V. Jahnes, Upper Saddle River, N.J., Paul Alfred Lauro, Brewster, N.Y., Nancy C. LaBianca, Yalesville, Conn., and Michael J. Rooks, Briarcliff Manor, N.Y.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "A method for fabricating a negative thermal expanding system device includes coating a wafer with a thermally decomposable polymer, patterning the decomposable polymer into repeating disk patterns, releasing the decomposable polymer from the wafer and forming a sheet of repeating patterned disks, suspending the sheet into a first solution with seeding compounds for electroless decomposition, removing the sheet from the first solution, suspending the sheet into a second solution to electrolessly deposit a first layer material onto the sheet, removing the sheet from the second solution, suspending the sheet into a third solution to deposit a second layer of material having a lower TCE value than the first layer of material, separating the patterned disks from one another, and annealing thermally the patterned disks to decompose the decomposable polymer and creating a cavity in place of the decomposable polymer."

The patent application was filed on Oct. 18, 2010 (12/906,690). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,241,957&OS=8,241,957&RS=8,241,957

Written by Satyaban Rath; edited by Hemanta Panigrahi.

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Axikin Pharmaceuticals Assigned Patent

ALEXANDRIA, Va., Aug. 18 -- Axikin Pharmaceuticals, San Diego, has been assigned a patent (8,242,118) developed by 15 co-inventors for "arylsulfonamide derivatives for use as CCR3 antagonists in the treatment of inflammatory and immunological disorders." The co-inventors are Yingfu Li, Nara-ken, Japan, Akihiko Watanabe, Shizuoka-ken, Japan, Timothy B. Lowinger, Guilford, Conn., Kevin Bacon, Hyogo-ken, Japan, Norihiro Kawamura, Nara-ken, Japan, Takuya Shintani, Kyoto-fu, Japan, Tetsuo Kikuchi, Nara-ken, Japan, Toshiya Moriwaki, Nara-ken, Japan, Klaus Urbahns, Hyogo-ken, Japan, Keiko Fukushima, Saitama-ken, Japan, Noriko Nunami, Nara-ken, Japan, Takashi Yoshino, Shiga-ken, Japan, Toshiki Murata, Nara-ken, Japan, Megumi Yamauchi, Shiga-ken, Japan, and Hiroko Yoshino, Shiga-ken, Japan.

The abstract of the patent published by the U.S. Patent and Trademark Office states: "The present invention relates to a sulfonamide derivative which is useful as an active ingredient of pharmaceutical preparations. The sulfonamide derivatives of the present invention have CCR3 (CC type chemokine receptor) antagonistic activity, and can be used for the prophylaxis and treatment of diseases associated with CCR3 activity, in particular for the treatment of asthma, atopic dermatitis, allergic rhinitis and other inflammatory/immunological disorders."

The patent application was filed on April 19, 2010 (12/763,072). The full-text of the patent can be found at http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=8,242,118&OS=8,242,118&RS=8,242,118

Written by Satyaban Rath; edited by Hemanta Panigrahi.

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